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Home > PRODUCTS > Semiconductor EquipmentSpin Coater T100

Spin Coater T100

Spin Coater , 
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Description

Spin Coating System T100

Model: T100
 
Product Description: mainly used in liquid, gel formation in the surface film for silicon wafers, glass, ceramics and plate surface coating process. In research, education, production applications.
Main features:
* High-precision multi-program controller:
Storage can be set 7 different samples of rotation during the coating process.
Each coating process step can be set to different speeds of 25 states;
LCD screen can display:
1. The first N-coating process
2. In which the working section
3. Vacuum suction sheet status.
4. To set the time; and real-time run-time.
5. Set speed; and real-time speed state.
* In English and two operating systems available.
* Vacuum-chip system more secure:
Equipped with vacuum sensors, coating the working process real-time detection system computer vacuum,
Must be in a safe vacuum, the motor started running. Security is not flyer.
* Variable speed motor, speed more accurate:
300--10000 r / min, speed stability: + - 0.1%
The maximum speed of 10000 rev / min
 
Technical parameters:
Single-phase AC power supply: 220V.50Hz
Motor power: 120W
Rotary vacuum suction cup diameter: 4 inches (102mm, the standard configuration)
Optional configuration: diameter 10-150mm substrate orders accepted.
Speed: 300 - 10,000 rpm / min.
Can set the time :1 --- 9999 seconds.
Standard Packaging: Size: 260mm wide x 350mm deep x 260 mm high,
Optional accessories 1,60 l / min with oil pump
2, special vacuum suction
3,70 l / min oil-free vacuum pump


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  • Pick and Place Machine
  • Reflow Oven
  • Wave Soldering Machine
  • Solder Paste Printing
  • PCB Board Handling
  • PCB inspection Equipment
  • SMT Peripheral Equipment
  • Feeder and SMT Consumables
  • Dip Soldering System
  • Semiconductor Equipment

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